Nanoimprint Lithography or NIL is a process used to fabricate nanoscale patterns typically used in the areas of electronics, optics, photonics or biology. It creates patterns by mechanically deforming an imprint resist that is typically made from a monomer or polymer and cured using UV light. The nanoimprint lithograpy process is characterized by low cost, high throughput and high resolution and is a much simpler process than its rival optical lithography.